Linear infrared heating emitter

Wed, 24 Jun 2026 00:55:47 +0800

On a 300mm line, the scheduler doesn’t pause just because your bake profile drifted. A soft bake that’s off by half a degree can kick off a linewidth excursion that snowballs into scrap. Convection ovens fight you on cleanroom space and cycle time, and hot plates? They give you edge-to-center gradients that force a yield-for-throughput trade you can’t really afford.

What actually matters under the hood

We built the linear infrared emitter around one hard constraint: temperature uniformity across the wafer, not just the average. Short-wave NIR goes through a stabilized quartz window, tuned so the spectral output is absorbed preferentially by the photoresist stack. That keeps the substrate from overshooting. The payoff is wafer-level uniformity of ±0.1°C across the active bake zone, with ramp-up that responds in single-digit milliseconds. The emitter runs in Class 1–100 cleanrooms because the assembly is sealed—particle generation is essentially zero, and outgassing is controlled so the lithography stack stays protected.

Linear on Five-Star Infrared Heating Systems

Linear infrared heating emitter

What actually matters under the hood